Nyob rau hauv cov txheej txheem tsim chip, tsis yog tsuas yog cov khoom siv tseem ceeb lossis cov khoom siv xws li lithography machine, etching machine, photoresists, thiab silicon wafers yog xav tau, tab sis kuj tseem muaj roj tshwj xeeb hauv kev lag luam hu ua hluav taws xob roj. Raws li ib qho ntawm cov khoom siv raw khoom hauv cov khoom lag luam, cov roj hluav taws xob tshwj xeeb tau koom nrog ntau yam kev sib txuas xws li etching, tu, epitaxial loj hlob, thiab ion implantation. Lawv yog indispensable rau tag nrho cov nti tsim kev lag luam, yog li lawv hu ua "ntshav" ntawm semiconductors.
Txij li cov roj hluav taws xob cuam tshuam rau kev ua haujlwm, kev sib koom ua ke, kev tawm los thiab lwm yam tseem ceeb ntawm cov khoom siv hluav taws xob sib txuas, muaj cov kev xav tau siab rau cov purity ntawm hluav taws xob hluav taws xob. Vim muaj cov txheej txheem loj, cov roj hluav taws xob tau dhau los ua cov khoom siv loj thib ob, thiab nws cov nqi sib faib yog thib ob tsuas yog cov khoom siv silicon wafers.
Feem ntau siv etching gases rau semiconductor
1. Fluoride Gas:
Sulfur hexafluoride SF6 yog ib qho ntawm feem ntau siv fluoride gases hauv semiconductor qhuav etching. Nws yog tus cwj pwm los ntawm kev xaiv siab thiab muaj zog etching tus nqi. Nws yog tsim rau etching ntawm tsawg dielectric tas li cov ntaub ntawv xws li silicon oxide, silicon fluoride, silicon nitride, thiab lwm yam.
Cov pa roj carbon tetrafluoride (CF4)
Cov pa roj carbon tetrafluorideis CF4 kuj tseem siv rau hauv ntau cov txheej txheem wafer etching. CF4 tam sim no yog cov roj plasma etching ntau tshaj plaws hauv kev lag luam microelectronics. Nws tuaj yeem siv dav hauv etching ntawm cov ntaub ntawv nyias nyias xws li silicon, silicon dioxide, silicon nitride, phosphosilicate iav thiab tungsten, thiab hauv kev ntxuav ntawm cov khoom siv hluav taws xob thiab lub hnub ci. Nws kuj tseem siv dav hauv kev tsim cov tshuab laser, roj theem rwb thaiv tsev, cov tub yees txias qis, cov tshuaj tiv thaiv xau, tswj tus cwj pwm ntawm qhov chaw foob pob hluav taws, thiab cov tshuaj tua kab mob hauv cov ntawv luam tawm.
Nitrogen Trifluoride NF3 Gas muaj qhov qeeb tshaj plaws ntawm cov roj fluoride, tab sis muaj kev xaiv zoo. Nws ua haujlwm zoo thaum cov ntaub ntawv sib txawv raug cais tawm ntawm ib leeg thiab tseem tsim nyog rau etching cov ntaub ntawv organic.
2. Oxide Gas:
O2
O2 yog cov pa roj oxide ntau nyob rau hauv semiconductor qhuav etching thiab tuaj yeem siv los oxidize oxides thiab cov ntaub ntawv hlau. O2 muaj qhov qeeb etching tab sis muaj zog xaiv, yog li nws tsim nyog rau etching feem ntau cov ntaub ntawv oxide.
H2O
H2O yog cov pa roj oxide uas muaj kev so zoo thiab tuaj yeem siv rau etching nyuaj photoresists thiab organic resins. Txawm li cas los xij, thaum sib xyaw nrog cov roj fluoride, nws yuav cuam tshuam rau kev xaiv ntawm cov tshuaj tiv thaiv.
N2O
N2O tuaj yeem siv los oxidize hydrogenated silicon thiab cov ntaub ntawv hlau. Nws etching tus nqi yog ceev tshaj O2, tab sis nws selectivity yog phem dua O2.
Cov saum toj no yog cov hom thiab cov yam ntxwv ntawm cov pa roj uas nquag siv hauv semiconductor qhuav etching. Lawv daim ntawv thov nyob rau hauv cov txheej txheem etching yog ib qho tseem ceeb heev. Rau cov khoom sib txawv thiab cov hom phiaj etching sib txawv, nws yog ib qho tsim nyog los xaiv cov pa roj uas tsim nyog rau etching.
Pebyog professional ETCHING GAS tus neeg muag khoom, wtxais tos hu rau peb kom paub meej ntxiv!
Peb qhov chaw nyob
Room 1102, Unit C, Xinjing Center, No.25 Jiahe Road, Siming District, Xiamen, Fujian, Suav teb
Xov tooj
+86-592-5803997
susan@xmjuda.com
