Hauv kev tsim khoom semiconductor, wafer tu yog ib qho ntawm cov kauj ruam tseem ceeb tshaj plaws los txiav txim siab nti tawm thiab kev ua haujlwm. Raws li cov txheej txheem thev naus laus zis txuas ntxiv zuj zus, cov kev xav tau rau kev tu cov txheej txheem tau mus txog qhov tsis tau pom dua los ntawm kev nruj nruj. Thaum ib txwm siv RCA wafer tu tseem yog lub hauv paus ntawm kev ntxuav ntub dej - siv tau los ntawm kev tshem tawm cov kab mob tsis muaj kab mob thiab cov khoom tsis zoo - nws ntsib cov teeb meem tseem ceeb thaum hais txog cov organic residues nyuaj thiab ziab cov qauv ilv.
Qhov no yog qhov siab -Kev ua tau zoo Hydrofluoroether (HFE) ua pov thawj nws tus nqi. Raws li ib qho tseem ceeb tshwj xeeb hnyav hnyav nyob rau hauv niaj hnub semiconductor tu txheej txheem, HFE muaj ib tug meej, ib puag ncig raws, thiab zoo heev daws. Tsab ntawv xov xwm no qhia txog yuav ua li cas HFE 347 tuaj yeem ua tiav kev tu semiconductor wafer, ua kom muaj zog ntxiv thiab hloov kho mus rau cov qauv siv.
Cov Kev txwv ntawm Kev Tu Kom Huv & HFE lub luag hauj lwm Strategic
Cov txheej txheem ntxuav RCA classic yog nyob ntawm siab -kub, siab -purity aqueous tshuaj daws (xws li, SC-1, SC-2). Thaum zoo heev ntawm kev tshem tawm cov ions, cov kab mob hlau, thiab cov khoom, cov txheej txheem muaj ob qhov kev txwv tsis pub muaj:
Kev ua tau zoo txwv tsis pub muaj cov kab mob tshwj xeeb xws li photoresist residues, cov roj twj tso kua mis, cov roj silicone, thiab cov roj nplua nyeem siab heev los ntawm cov khoom siv precision.
Qhov kev sib tw "dej" ziab: Dej qhov siab ntawm qhov siab ua rau muaj kev pheej hmoo tseem ceeb thaum lub sijhawm ziab kawg, feem ntau ua rau cov qauv tawg thiab cov dej tsis zoo, tshwj xeeb tshaj yog nyob rau hauv siab - yam - qauv piv.
HFE 347, raws li cov kuab tshuaj hydrofluoroether siab heev, hais txog cov mob no ncaj qha los ntawm nws cov khoom tshwj xeeb physicochemical, tso nws tus kheej ua qhov nruab nrab zoo tshaj plaws rau "precision dry-hauv- ntub tu."
Xya qhov txiaj ntsig tseem ceeb ntawm HFE 347 hauv Wafer Tu
Kev koom ua ke HFE 347 rau hauv koj cov txheej txheem tu wafer muab cov txiaj ntsig zoo hauv qab no:
Superior Drying Performance rau "Zero-Defect" Cov txiaj ntsig
Nrog rau qhov tsis tshua muaj qhov nro thiab qhov tsis muaj zog, HFE 347 evaporates tag nrho yam tsis muaj qhov seem, tshem tawm cov qauv kev sib tsoo thiab cov dej ntws tawm - qhov tshwm sim tsis tuaj yeem nrog tom qab -RCA ntxuav aqueous ziab.
Khoom zoo heev Compatibility
Yooj yim rau wafers, hlau, ceramics, thiab feem ntau cov polymers, nws tiv thaiv corrosion los yog puas, ua kom cov txheej txheem ntxuav tsis qhia qhov tsis xws luag.
Lub Hom Phiaj Huv Huv
Kev solubility tshwj xeeb rau PFPE (perfluoropolyether) lub tshuab nqus tsev twj roj, roj, qee yam photoresist residues, thiab cov khoom organic ua rau nws qhov hnyav ntawm kev xaiv kom tshem tawm cov kab mob tshwj xeeb.
Cov txheej txheem siab Flexibility
Tau tshaj immersion, tshuaj tsuag, vapor degreasing, thiab lwm yam wafer tu txoj kev. Tshwj xeeb tshaj yog haum rau kev ntxuav precision qhov chaw thiab chamber Cheebtsam offline, tiv thaiv kom txhob kis kab mob mus rau wafers.
Environmental & Safety Ua raws cai
Nta xoom ODP (Ozone Depletion Potential) thiab qis GWP (Lub Ntiaj Teb Warming Potential), ua raws li cov cai nruj me ntsis. Nws muaj toxicity tsawg thiab tsis yog -flammaability txhim khu kev ruaj ntseg ua hauj lwm.
Azeotrope tsim muaj peev xwm
Muaj peev xwm tsim azeotropic sib tov nrog cawv (piv txwv li, IPA), ua kom "ib zaug- kauj ruam" huv si- thiab- txheej txheem qhuav: dissolve cov kab mob organic ua ntej, tom qab ntawd tshem tawm nrog cov ntshiab HFE 347 kom ziab kom zoo, ua kom cov haujlwm ua haujlwm zoo.
Txo kev siv dej thiab dej khib nyiab
Raws li tsis yog- cov kuab tshuaj aqueous, HFE 347 txo qhov kev cia siab ntawm cov dej ntshiab huv thiab txo qhov hnyav ntawm - nqi kho dej khib nyiab.
Kev sib koom ua ke HFE 347 rau hauv Koj Qhov Kev Ua Haujlwm Huv Huv
HFE 347 tsis yog tsim los hloov RCA cov txheej txheem tu, tab sis kom ua tiav nws zoo kawg nkaus:
Raws li ua ntej-Txoj Kev Ntxuav: Tshem tawm cov kab mob organic los ntawm cov neeg nqa khoom wafer, caj npab neeg hlau, lossis cov khoom hauv chav kom tiv thaiv kev sib kis -.
Raws li Kev Tshaj Tawm -Txheej Txheej Txheej Txheem: Siv tau zoo tom qab lithography, etching, lossis CMP rau tshem tawm cov organic residues thiab cov khoom, tshwj xeeb tshaj yog nyob rau hauv dej- cov qauv rhiab heev.
Raws li Drying Medium: Siv rau kev hloov chaw ziab tom qab yaug dej zaum kawg -ib txoj kev txhim khu kev qha los tiv thaiv cov qauv txheej txheem siab heev.
Kev sib piv ntawm RCA Standard Wet Cleaning thiab HFE Solvent Cleaning
| Feature | RCA Standard Wet Cleaning | HFE Solvent Ntxuav |
|---|---|---|
| Nruab nrab | Aqueous tshuaj tov (muaj zog acids, bases, oxidizers) | Organic fluoroether solvent (tsis yog{0}}aqueous) |
| Thawj Mechanism | Cov tshuaj tiv thaiv muaj zog (oxidation, complexation, etching) | Main Lub cev dissolution, tsis muaj zog tshuaj lom neeg kev sib tshuam |
| Target Contaminants | Inorganic pollutants (hlau ions, hais), organic residues | Cov tshuaj lom neeg tshwj xeeb (greases, resins, photoresist, thiab lwm yam) |
| Kev Sib Tw Qhuav | Significant challenge: High surface tension of water leads to watermarking and pattern collapse, requiring special drying techniques like IPA vapor drying or Marangoni drying. | Qhov txiaj ntsig zoo: Tsis tshua muaj qhov nro thiab qhov tsis muaj zog siab ua kom cov khoom seem -dawb tus kheej- ziab. |
| Eco-kev phooj ywg & Kev nyab xeeb | Siv cov khoom loj ntawm siab - cov tshuaj purity thiab dej ntshiab huv, tsim cov dej khib nyiab ntau heev rau kev kho. | Kev tswj hwm tshuaj yooj yim, txawm tias VOC emissions xav tau kev txiav txim siab. |
Cov Ntaub Ntawv Tseem Ceeb Ntawm HFE-347
|
Lub npe tshuaj: |
1,1,2,2-Tetrafluoroethyl 2,2,2-trifluoroethyl ether |
|
CAS: |
406-78-0 |
|
MF: |
C4H3F7O |
|
MW: |
200.05 |
|
EINECS: |
609-858-6 |
|
Chemical Properties |
|
|
Boiling point |
56.2 degree |
|
ceev |
1.487 |
|
Refractive Index |
1.276 |
|
Specific Gravity |
1.487 |
|
CAS DataBase Reference |
406-78-0 (CAS DataBase Reference) |
|
EPA Tshuaj Registry System |
HFE-347pcf2 (406-78-0) NPE |
|
Cov khoom kuaj |
Specifications |
|
Qhov tshwm sim |
Ntshiab xim tsis muaj kua |
|
Purity |
Ntau dua lossis sib npaug li 99.5% |
|
Dej |
Tsawg dua los yog sib npaug li 100ppm |
Tsav los ntawm Moore Txoj Cai Lij Choj, semiconductor wafer tu tsis yog hais txog kev tshem tawm cov av ntxiv lawm -nws yog nanometer- nplai precision engineering. HFE 347 sawv cev rau cov kev daws teeb meem ntse rau cov teeb meem niaj hnub semiconductor kev tsim khoom, sib txuas cov txiaj ntsig ntawm kev ntxuav ntub nrog qhov kawg kawg - taw tes ntawm kev ua kom qhuav.
Raws li ib tug neeg muab kev ntseeg siab HFE, peb muab HFE 347 nrog tshwj xeeb purity siab thiab batch - mus rau -batch sib xws, kom ntseeg tau tias koj cov txheej txheem ntxuav wafer tseem ruaj khov, txhim khu kev qha, thiab muaj txiaj ntsig. Txawm hais tias koj tab tom txhim kho tom ntej - tiam chips lossis optimizing cov kab ntau lawm, nws yog tus txheej txheem tus khub koj tuaj yeem nyob ntawm.
Hu rau peb hnub no kom paub ntau ntxiv txog HFE hydrofluoroether HFE347 !
Peb qhov chaw nyob
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